HE-Arc > Ingénierie > Applied Research > Research Groups > Micro & Nano-Systems - Equipments
Micro & Nano-Systems - Equipments
 

Laser Microstructuring

A nanosecond UV laser:

  • Coherent AVIA 355-7 (Nd:YAG withTHG)
  • Wave length: 355 nm
  • Pulse duration: 20 ns
  • Rate of fire: a pulse until 300 kHz
  • Max power: 8W
  • Max energy per pulse: 200 µJ
  • Optical guiding : 2D scanner (90x90 mm field with a 20 µm spot)
  • XYZA positioning axis

A femtosecond laser:

  • S-Pulse Amplitude HP Systems (Yb:KGW with SHG/THG module)
  • Wave length: 1030 nm (IR), 515 nm (VIS), 343 nm (UV)
  • Pulse duration: 500 fs
  • Rate of fire: a pulse until 300 kHz
  • Max power: 2.5 W (IR), 1 W (VIS), 0.5 W (UV)
  • Max energy per pulse: 250 µJ (IR), 100 µJ (VIS), 30 µJ (UV)
  • Optical guiding: 3D scanners (IR, VIS & UV), 50x50x6 mm field, with a 30 µm (IR), 20 µm (VIS), 10 µm (UV) spot
  • XYZAB positioning axis

Microstructuring in the cleanroom

  • Cleanroom ISO8 class in yellow light.
  • Mask aligners, exposure system by programmable pixel, wet benches, thermal diffusion oven (maximum 1200 ° C)
  • 2 anodic bonding systems (glass on silicium)
  • 1 fusion bonding system (glass on glass)

Deposition and etching

  • 1 thermal and electron gun evaporative
  • 2 sputtering systems, 3 PECVD systems, 2 plasma activation systems for PDMS bonding.
  • 1 8 inches DRIE (deep reactive ion etching) system.
  • 1 Langmuir Blodgett system for creating nanofilms.
  • 1 dip-coating system.
  • 1 graphene deposition system.
  • 2 CVD reactors for depositing parylene.
  • 1 parylene deposition reactor at atmospheric pressure.
  • 1 microdrops robotic dispensing system.
  • 1 local etching system by atmospheric plasma.
  • 2 excimer lamp (222 nm and 172 nm)
  • 1 UV lamp for polymerization of various materials.

3D generation

  • 1 micro-nano fibers creation system by electrospinning
  • Equipment necessary for the LIGA technology stereolithography by UV laser.
  • 3D printer

Caracterisation

  • 1 FTIR infrared spectroscopy system
  • 1 μ-Raman spectroscopy system
  • 1 UV-VIS-NIR spectroscopy system
  • 2 spectroscopy systems with OES optical emission for the analysis of plasmas
  • 1 fluorescence microscope
  • 1 multi-pressure source for microfluidics
  • 2 fixtures with syringe pumps and pressure sensors for the characterization of microfluidic systems
  • 1 system for measuring the liquid contact angle.
  • 1 viscometer
  • 1 conductivity meter
  • 1 "space" simulation room
 

aR&D

aR&D brochure (FR)

Group

Team

Equipments

Address

Neode
Eplatures-Grise 17
2300 La Chaux-de-Fonds
T +41 32 930 15 55
F +41 32 930 29 30
See on Google Maps

Any questions?

Group Leader:
Dr Herbert Keppner
+41 32 930 13 64

Associated Bachelor Degree

Microtechnologies and Electronics

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